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Particulate and molecular contamination control in EUV-induced H2-plasma in EUV lithographic scanner
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PDF] Offline study of next generation EUV pellicle materials and performances : From experimental design to material characterization | Semantic Scholar
![Particulate and molecular contamination control in EUV-induced H2-plasma in EUV lithographic scanner Particulate and molecular contamination control in EUV-induced H2-plasma in EUV lithographic scanner](https://www.spiedigitallibrary.org/ContentImages/Proceedings/11489/114890K/FigureImages/00002_PSISDG11489_114890K_page_2_1.jpg)